Optical Imaging in Projection MicrolithographyAlfred K. Wongillustrated EditionLabel: SPIE PressDescription: Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning clarity in systematic formulation physical insight into emerging ideas as well as a system level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts which will likely help facilitate dialog among technologists.
This product would be best fit for those interested in studying the fabrication and use of advanced materials in a laboratory or industrial environment.
